Application note no. 21182
Spatial atomic layer deposition is an emerging method for rapid, scalable deposition of thin films with nanoscale thickness control. As the applications for nanoscale thin films and SALD continue to grow, so does the need for quick and efficient methods of analysis. FTIR analysis of thin films can be achieved by depositing said films on ZrO2 nanoparticles and pressing onto a stainless-steel grid, effectively increasing the surface area of the film and the relative signal. However, this process requires the purchase of ZrO2 nanoparticles, and may not be well suited for setups other than conventional ALD deposition systems. Another method of FTIR analysis for thin films is the creation of KBr pellets.
This is achieved by grinding up the film and substrate together, which can be time consuming. Si and gold substrates tend to be an ideal choice for IR analysis of thin films due to their IR transparency. However, analysis by conventional methods, such as ATR or transmission, proves difficult due to the low pathlength of the films, resulting in low peak intensities.
This application note discusses the use of a high-incidence-angle Ge ATR method to analyze zinc oxide (ZnO) thin films deposited by SALD on Si substrates.
Read more below in our application note.
Have questions? Fill in the form below and a member of our team will get in touch.